Home > Innovative Custom PVD Machine >

PVD Nickle and Copper Sputtering Thin Film Coating Machine, Au Gold Conductive Film Deposition

Product Categories

PVD Vacuum Coating Machine [77]
Magnetron Sputtering Coating Machine [118]
Cathodic Arc Deposition Equipment [110]
Thermal Evaporation Coater [67]
Innovative Custom PVD Machine [59]
Roll to Roll Web Vacuum Metallizer [28]
PVD and PECVD DLC Coating System [31]
PVD Laboratory Coating Machine [8]
Glass Coating Machine [59]
Ceramic Coating Equipment [43]
PVD Chrome Vacuum Metal Deposition Machine [41]
PVD Jet Black Coating Equipment [20]
PVD Gold Coating Equipment [34]
PVD Rose Gold Coating Equipment [17]
PVD Rainbow Decorative Coating Equipment [15]
PVD Coating Service [49]

SHANGHAI ROYAL TECHNOLOGY INC.

Trust Seal

Verified Supplier

Credit Check

Supplier Assessment

Contact Now

PVD Nickle and Copper Sputtering Thin Film Coating Machine, Au Gold Conductive Film Deposition

Name: PVD Nickle and Copper Sputtering Thin Film Coating Machine Au Gold Conductive Film Deposition
Brand: ROYAL
Price: 1 USD

Quality PVD Nickle and Copper Sputtering Thin Film Coating Machine, Au Gold Conductive Film Deposition for sale

Brand Name : ROYAL

Model Number : RTAS

Certification : CE

Place of Origin : China

MOQ : 1 set

Price : depends on

Payment Terms : L/C, T/T

Supply Ability : 10 sets per month

Delivery Time : 10 to 12 weeks

Packaging Details : Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.

Technology : DC magnetron sputtering, PVD sputtering deposition, PVD vacuum coating

Applications : conductive film deposition, corrosion resistance film coating

Properties : Robust and high volume design machine

Sputtering targets : Ni, Cr, Cu, Au, Ag, Ta, Ti, SS, Al etc. pure metals

Factory Location : Shanghai city, China

Worldwide Service : Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America

Training Service : Machine operation, maintenance, coating process Recipes, program

Warranty : Limited warranty 1 year for free, whole life for machine

OEM & ODM : available, we support tailor made design and fabrication

Contact Now

Circuit Board Conductive Thin Film Deposition by PVD DC Sputtering Process, Copper plating, Au Sputteringdeposition

------Large Capacity, Flexible Modules Design, Precised Manufacturing.

Technical Advantages:

The DPC-RTAS1215+ Sputtering system is the upgraded version of the original ASC1215 model, the newest system has several advantages:

Higher Efficient Process:
1. Double sided coating is available by turnover fixture design
2. Up to 8 standard planar cathode flanges for multiple sources
3. Large capacity up to 2.2 ㎡ ceramic chips per cycle
4. Fully Automation, PLC+Touch Screen, ONE-touch control system

Lower Production Cost:
1. Equipped with 2 magnetic suspension molecular pumps, fast starting time, free maintenance;
2. Maximum heating power;
3. Octagonal shape of chamber for optimum space using, up to 8 arc sources and 4 sputtering cathodes for fast deposition of coatings

The DPC process- Direct Plating Copper is an advanced coating technology applied with LED and semiconductors in electronic industries. One typical application is Ceramic Radiating Substrate. Copper conductive film deposition on Aluminum Oxide (Al2O3), AlN substrates by PVD vacuum sputtering technology, has above all one big advantage compared to traditional manufacturing methods: DBC LTCC HTCC have much lower production costs.

Royal Technology’s team collaborated with our customer to develop the DPC process successfully applying PVD sputtering technology.

Applications of DPC:
HBLED
Substrates for solar concentrator cells
Power semiconductor packaging including automotive motor control
Hybrid and electric automobile power management electronics
Packages for RF
Microwave devices

Technical Specifications

Description	DPC-RTAS1215+
Chamber Height (mm)	1500
Chamber diameter (mm)	φ1200
Sputtering Cathodes Mounting Flange	4
Ion Source Mounting Flange	1
Arc Cathodes Mounting Flange	8
Satellites (mm)	16 x Φ150
Pulsed Bias Power (KW)	36
Sputtering Power (KW)	DC36 + MF36
Arc Power(KW)	8 x 5
Ion Source Power (KW)	5
Heating Power (KW)	36
Effective Coating Height (mm)	1020
Magnetic Suspension Molecular Pump	2 x 3300 L/S
Roots Pump	1 x 1000m³/h
Rotary Vane Pump	1 x 300m³/h
Holding Pump	1 x 60m³/h
Capacity	2.2 ㎡
Installation Area ( L x W x H) mm	420060003500

HMI + Touch Screen Operation System

PVD Nickle and Copper Sputtering Thin Film Coating Machine, Au Gold Conductive Film Deposition

Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.

Product Tags:

thin film coating equipment

dlc coating equipment

PVD Nickle and Copper Sputtering Thin Film Coating Machine, Au Gold Conductive Film Deposition Images

Inquiry Cart 0

Send your message to this supplier


*From:	Your email address is incorrect!
*To:	SHANGHAI ROYAL TECHNOLOGY INC.
*Subject:	Subject is empty!
*Message:	For the best results, we recommend including the following details: -Self introduction -Required specifications -Inquire about price/MOQ Characters Remaining: (0/3000) Please enter 20 to 3000 characters to contact this supplier!